Solid State Microfabrication Laboratory Equipment

The Solid State Microfabrication Laboratory is a Class 100/1000 (lithography/general processing) cleanroom laboratory. Currently funded research includes applications in microelectronics, micromachining, and optics. Specific equipment available for microfabrication includes:

LABORATORY AND SERVICES:

Class 1000 general processing area (600 sq. ft.);
Class 100lithography processing area (250 sq. ft.)
Deionized water system (18 Meg-ohm)
Process gasses (UPC grade)
Gowning room and service corridor

WET CHEMICAL PROCESSING:

Three laminar flow fume hoods (Class 100) for:

resists and solvents hood
specialized RCA clean hood
general acids and bases hood

PHOTOLITHOGRAPHY:

Mask aligner for contact printing (Karl Suss MJB UV-400)
e-beam direct write capability (Zeiss DSM 962 scanning electron microscope with control for direct write)
Photoresist spin and develop station (Headway).
Photo-resist bake ovens (Blue M)

PROCESSING and FILM DEPOSITION:

Reactive ion etching (RIE) parallel plate station (local design).
Atmospheric pressure oxidation/diffusion furnaces (three Mini-Brute units plus bubbler).
Rapid Thermal Processing system (AG410).
Cooke RF and DC sputtering system (two target) (targets available)
Denton RF and DC sputtering system for nano magnetic materials (three target) (targets available)
e-gun deposition systems
- Mullti-pocket e-gun metal deposition system.
- Single-pocket e-gun and thermal evaporation metal deposition system.
Laser ablation thin film deposition system (used for superconductors and ferroelectrics)
Vacuum chemical vapor deposition system (Thermco tubes, TEOS system, valve jungle; installation incomplete).
Vacuum Leak Check system.

ANALYSIS:

Ellipsometer for thin film thickness measurements; includes dual laser wavelengths, multiple angle, and computer control (Gaertner)
Surface profilometer (Tencor alpha-step 100) with GLX data logger
Scanning electron microscope with EDS microanalysis (Zeiss)
Scanning electron microscope with low vacuum environmental chamber(JOEL).
Atomic Force Microscope and Scanning Kelvin Probe Microscope (IBM custom)
Computer controlled measurement system including:
- DC semiconductor parameter analyzer (HP 4142).
- Picoammeter and current source, for quasi-static CV measurements (HP 4140).
- LCR meter, for high-frequency CV measurements (HP).
- S-parameter network analyzer (to 3GHz) (HP).
- Programmable pulse generator (Tektronix).
- Micromanipulator probe station.
Variable temperature step and repeat automatic probe station (Xynetics 1034XAG)
Low temperature microprobe (four probes down to ~76K) (MMR).

DESIGN, LAYOUT, and SIMULATION:

Project NORTHSTAR is campus-wide, centrally-administered network of over 250 engineering unix workstations for high-powered computing, design, and analysis. NORTHSTAR provides the environment for doing computer aided design (CAD) and simulation. In addition to the following standard CAD tools available on NORTHSTAR, we have Auto-CAD(PC) and L-Edit (on unix, PCs, and keyserved on Macintosh) for micromachining layout.

SUPREM-III and SUPREM-IV (fabrication process simulation)
FLOOPS (fabrication process simulation) ( examples)
FLUENT (fluid mechanics)
PISCES IIB (semiconductor device simulation)
MAGIC (mask design and layout)
L-Edit (mask design and layout)

ASSORTED OTHER EQUIPMENT:

Christopher.G.Levey[AT]dartmouth.edu